Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5

5/10/13

Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5

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Chemical Engineering :: Process Control and Instrumentation @ : Home > Chemical Engineering > Process Control and Instrumentation > Section 2 21. Pick out the wrong statement A. Proportional controller is normally used for level control in industrial applications. B. CSTR can be considered as a distributed parameter system. C. Distributed parameter approach gives partial differential equation. D. Non-linear behaviour is exemplified by an on-off controller. Answer & Explanation Answer: Option B Explanation: No answer description available for this question. Let us discuss. View Answer Workspace Report Discuss in Forum 22. Range of hydrogen gas constant volume themometer is __________ °C. www.indiabix.com/chemical-engineering/process-control-and-instrumentation/086005

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Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5

22. Range of hydrogen gas constant volume themometer is __________ °C. A. -10 to 20 B. 0 to 100 C. 100 - 500 D. 400 - 1000 Answer & Explanation Answer: Option B Explanation: No answer description available for this question. Let us discuss. View Answer Workspace Report Discuss in Forum

23. The initial value (t=0) of the unit step response of the transfer function [(s + 1)/(2s + 1)] is A.0 B.1/2 C.1 D.2 Answer & Explanation Answer: Option B Explanation:

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Section 1 Section 2 Section 3 Section 4

View Answer Workspace Report Discuss in Forum 24. The __________ of a vapor pressure thermometer is a primary element. A. pointer

Section 5 Section 6 Section 7 "Forgiveness is a virtue of the brave." - Indira Gandhi

B. Bourdon tube C. bulb D. none of these Answer & Explanation Answer: Option C Explanation: No answer description available for this question. Let us discuss. View Answer Workspace Report Discuss in Forum 25. The time constant of a first order process with resistance R and capacitance C is A. R + C B. R - C C. RC D. 1/RC Answer & Explanation Answer: Option C Explanation: No answer description available for this question. Let us discuss. View Answer Workspace Report Discuss in Forum < Prev 12345678910Next >

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Process Control and Instrumentation Section 2 - Chemical Engineering Questions and Answers Page 5

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Process Control and Instrumentation - Section 3 Process Control and Instrumentation - Section 4 Process Control and Instrumentation - Section 5 Process Control and Instrumentation - Section 6 Process Control and Instrumentation - Section 7

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