Application of Physical Vapour Deposition and Chemical Vapour Deposition for Industrial Components

APPLICATION OF PHYSICAL VAPOUR  DEPOSITION AND CHEMICAL VAPOUR  DEPOSITION FOR  INDUSTRIAL COMPONENTS

TRIBOLOGY

ASSIGNMENT 1 A SAI DHEERAJ 14BME0922

APPLICATION

OF  P HYSICAL VAPOUR  DEPOSITION AND  C HEMICAL

VAPOUR  DEPOSITION FOR  INDUSTRIAL COMPONENTS

INTRODUCTION: Physical Vapo D!posi"io# $PVD%:

Physical Vapor Dposi!io" #PVD$ is a collc!i% s! o& procsss 's( !o (posi! !hi" layrs o& )a!rial* !ypically i" !h ra"+ o& &, "a"o)!rs !o s%ral )icro)!rs- PVD procsss ar "%iro")"!ally &ri"(ly %ac'') (posi!io" !ch"i.'s co"sis!i"+ o& !hr &'"(a)"!al s!ps / •

Vaporia!io" o& !h )a!rial &ro) a soli( so'rc assis!( y hi+h !)pra!'r %ac'') or +aso's plas)a-

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Tra"spor!a!io" o& !h %apor i" %ac'') or par!ial %ac'') !o !h s's!ra! s'r&ac-

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o"("sa!io" o"!o !h s's!ra! !o +"ra! !hi" &il)s-

Di&&r"! PVD !ch"olo+is '!ili !h sa) !hr &'"(a)"!al s!ps '! (i&&r i" !h )!ho(s 's( !o +"ra! a"( (posi! )a!rial- Th !,o )os! co))o" PVD procsss ar !hr)al %apora!io" a"( sp'!!ri"+- Thr)al %apora!io" is a (posi!io" !ch"i.' !ha! rlis o" %aporia!io" o& so'rc )a!rial y ha!i"+ !h )a!rial 'si"+ appropria! )!ho(s i" %ac'')Sp'!!ri"+ is a plas)a3assis!( !ch"i.' !ha! cra!s a %apor &ro) !h so'rc !ar+! !hro'+h  o)ar()"! ,i!h acclra!( +aso's io"s #!ypically Ar+o"$- I" o!h %apora!io" a"( sp'!!ri"+* !h rs'l!i"+ %apor phas is s's.'"!ly (posi!( o"!o !h (sir( s's!ra! !hro'+h a co"("sa!io" )cha"is)Dposi!( &il)s ca" spa" a ra"+ o& ch)ical co)posi!io"s as( o" !h so'rc )a!rial or )a!rials- 'r!hr co)posi!io"s ar accssil !hro'+h rac!i% (posi!io" procsssRl%a"! 5a)pls i"cl'( co3(posi!io" &ro) )'l!ipl so'rcs* rac!io" ('ri"+ !h

!ra"spor!a!io" s!a+ y i"!ro('ci"+ a rac!i% +as #"i!ro+"* o5y+" or si)pl hy(rocaro" co"!ai"i"+ !h (sir( rac!a"!$* a"(  pos!3(posi!io" )o(i&ica!io" !hro'+h !hr)al or )cha"ical procssi"+-

Ch!&ical 'apo (!posi"io# #CVD$

h)ical %apor (posi!io" is a !ch"i.' &or (posi!i"+ !hi" &il)s o& )a!rials o" ,a&rs or o!hr s's!ra!s- So'rc +ass ar i"!ro('c( i"!o a rac!io" cha)r a"( "r+y is appli( !hro'+h ha!* hi+h &r.'"cy hi+h %ol!a+ #R Po,r$* or o!hr !ch"i.'s !ha! rs'l! i" !h (co)posi!io" o& !h so'rc +as a"( rac!io" o& !h ch)icals !o &or) a &il)- h)ical %apor  (posi!io" $VD% is a ch)ical procss 's( !o pro('c hi+h3p'ri!y* hi+h3pr&or)a"c soli( )a!rials- Th procss is o&!" 's( i" !h s)ico"('c!or i"('s!ry !o pro('c !hi" &il)sTh s)ico"('c!or i"('s!ry is !h a++r+a! collc!io" o& co)pa"is "+a+( i" !h (si+" a"( &arica!io" o& s)ico"('c!or (%ics- A !hi" &il) is a layr o& )a!rial ra"+i"+ &ro) &rac!io"s o& a "a"o)!r !o s%ral )icro)!rs i" !hic6"ss- I" a !ypical VD procss* !h ,a&r #s's!ra!$ is 5pos( !o o" or )or %ola!il prc'rsors* ,hich rac! a"(7or (co)pos o" !h s's!ra! s'r&ac !o pro('c !h (sir( (posi!- A ,a&r is a !hi" slic o&

s)ico"('c!or )a!rial* s'ch as a silico" crys!al* 's( i" !h )a"'&ac!'r o& i"!+ra!(

circ'i!s a"( o!hr )icro (%icsr.'"!ly* %ola!il y3pro('c!s ar also pro('c(* ,hich ar r)o%( y +as &lo, !hro'+h !h rac!io" cha)r-

APPLICATIONS IN INDUSTRIAL COMPONENTS Bri&ly Physical Vapor Dposi!io" #PVD$ is 's( i" a %ari!y o& applica!io"s* i"cl'(i"+ &arica!io" o& )icrolc!ro"ic (%ics* i"!rco""c!s* a!!ry a"( &'l cll lc!ro(s* (i&&'sio" arrirs* op!ical a"( co"('c!i% coa!i"+s* a"( s'r&ac )o(i&ica!io"s ,hras #VD% is o&!" 's( i" !h s)ico"('c!or i"('s!ry !o pro('c !hi" &il)s- Th s)ico"('c!or i"('s!ry is !h a++r+a! collc!io" o& co)pa"is "+a+( i" !h (si+" a"( &arica!io" o& s)ico"('c!or (%ics-

B!#!)i"s o) Physical Vapo D!posi"io# •

E"%iro")"!ally &ri"(ly al!r"a!i% !o o!hr )!al coa!i"+ !ch"olo+is s'ch as lc!ropla!i"+

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R('cs ,i+h! a"( i"crass pr&or)a"c

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Pro!c!s a+ai"s! corrosio"

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8o, &ric!io"

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a"  appli( !o a %ari!y o& )a!rials

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Pro!c!s a+ai"s! ,ar a"( &r!!i"+

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Hi+hr har("ss

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Thr)al s!aili!y

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Ha! a"( ,ar rsis!a"c

*PVD )o F!""i#+ ,!a Po"!c"io# i# A!ospac! i#(-s"y I" !h arospac i"('s!ry* &r!!i"+* or !h a(hsi% !ra"s&r o& )a!rial !," co"!ac!i"+ s'r&acs* ca" la( !o arasi% ,ar a"( crac6 &or)a!io"s i" )cha"ical co)po""!sApplyi"+ PVD coa!i"+s !o )cha"ical co)po""!s i" ! "+i"s ca" hlp pro!c! a+ai"s! &r!!i"+- PVD coa!i"+s ha% hi+h har("ss a"( lo, &ric!io"* ,hich )a6s i! a" i(al &'"c!io"al )!al coa!i"+ i" !h arospac i"('s!ryBca's o& !h hi+h !)pra!'rs PVD coa!i"+s ar appli( a!* !hy ar pr&c!ly s'i!( &or !h arospac i"('s!ry- l'c!'a!i"+ !)pra!'rs &ro) !h "+a!i%s !o !h hi+h h'"(r(s o& (+rs clsi's r.'ir a )!al coa!i"+ !ha! ca" ,i!hs!a"( !h 5!r)s- hoosi"+ PVD &or i!:s !hr)al s!aili!y a"( corrosio" rsis!a"c )a6s i! a +ra! op!io" &or arospac )!al &i"ishi"+ro) !'ri"s a"( co)prssio" la(s !o ari"+s* )o'"!s a"( 6"'c6l oi"!s* !hr ar )a"y applica!io"s &or physical %apor (posi!io" i" !h arospac i"('s!ry- o"!ac! B"( Pla!i"+ &or  )or i"&or)a!io" ao'! physical %apor (posi!io" ca"  appli( o" )cha"ical co)po""!s &or !h arospac i"('s!ry-

B!#!)i"s o) Ch!&ical Vapo- D!posi"io# oa!i"+s &or a %ari!y o& applica!io"s s'ch as ,ar rsis!a"c* corrosio" rsis!a"c* hi+h !)pra!'r pro!c!io"* rosio" pro!c!io" a"( i" S)ico"('c!ors a"( rla!( (%ics s'ch as I"!+ra!( circ'i!s* s"sors a"( op!olc!ro"ic (%ics- I! is also 's( !o pro('c cra)ic )a!ri5 co)posi!s s'ch as caro"3caro"* caro"3silico" cari( a"( silico" cari(3silico" cari( co)posi!s-

*Ch!&ical Vapo D!posi"io# )o I#"!+a"!( Cic-i"s a#( Na#os"-c"-!s As i"!+ra!( circ'i!s* )icrolc!ro)cha"ical sys!)s #MEMS$* a"( o!hr lc!ro"ic a"(  pho!o"ic sys!)s co) )or co)pl5* !h i"crasi"+ co"s!rai"!s o" (posi!( layrs

r.'ir (posi!io" o%r ,i(ly %aryi"+ co"(i!io"s- h)ical %apor (posi!io" #VD$  pro%i(s !h "(( &l5iili!y- Si"+l a"( )'l!ipl layrs o& VD s)ico"('c!ors* (ilc!rics* a"( )!als ca"  &or)( o%r a ,i( ra"+ o& (posi!io" co"(i!io"s i" rac!ors o& (i&&r"! +o)!ris- Plas)a3"ha"c( VD #PEVD$* hi+h3("si!y plas)a VD #HDPVD$* a"( a!o)ic3layr (posi!io" #A8D$ ()o"s!ra! !h %ol'!io" o& VD !o )! i"crasi"+ly co)pl5 "(s-

*Hi+h "!&p!a"-! po"!c"io# a#( !#ha#ci#+ !sis"a#c! "o .!a -si#+ CVD Thr ar a ,i( ra"+ o& cra)ic coa!i"+s !ha! ca"  appli( !o )!al co)po""!s i" or(r !o "ha"c !hir &'"c!io"al propr!is- Mos! cra)ic coa!i"+s ar lc!rically "o"co"('c!i% #)a6i"+ !h) 5cll"! i"s'la!ors$* ha% a si+"i&ica"!ly hi+hr l%l o& arasio" rsis!a"c !ha" )os! )!als* a"( ar capal o& )ai"!ai"i"+ !hir i"!+ri!y '"(r s%rly l%a!( !)pra!'rs* so)!i)s 'p !o 4*;00 (+rs ahr"hi!-